International Journal of
Physical Sciences

  • Abbreviation: Int. J. Phys. Sci.
  • Language: English
  • ISSN: 1992-1950
  • DOI: 10.5897/IJPS
  • Start Year: 2006
  • Published Articles: 2569

Full Length Research Paper

Study on laser etching mechanism of aluminum thin film on polyimide

Liu Xiao-Li
  • Liu Xiao-Li
  • Science and Technology on Vacuum Technology and Physics Laboratory, Lanzhou Institute of Physics, Lanzhou 730000, China
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Xiong Yu-Qing
  • Xiong Yu-Qing
  • Science and Technology on Vacuum Technology and Physics Laboratory, Lanzhou Institute of Physics, Lanzhou 730000, China
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Ren Ni
  • Ren Ni
  • Science and Technology on Vacuum Technology and Physics Laboratory, Lanzhou Institute of Physics, Lanzhou 730000, China
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Yang Jian-Ping
  • Yang Jian-Ping
  • Science and Technology on Vacuum Technology and Physics Laboratory, Lanzhou Institute of Physics, Lanzhou 730000, China
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Wang Rui
  • Wang Rui
  • Science and Technology on Vacuum Technology and Physics Laboratory, Lanzhou Institute of Physics, Lanzhou 730000, China
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Wu Gan
  • Wu Gan
  • Science and Technology on Vacuum Technology and Physics Laboratory, Lanzhou Institute of Physics, Lanzhou 730000, China
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Wu Sheng-Hu
  • Wu Sheng-Hu
  • Science and Technology on Vacuum Technology and Physics Laboratory, Lanzhou Institute of Physics, Lanzhou 730000, China
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  •  Received: 20 January 2015
  •  Accepted: 16 April 2015
  •  Published: 16 May 2015

Abstract

In order to study the laser etching mechanism for aluminum thin film on polyimide substrate, the etching process was simulated by the finite element analysis software ANSYS, and etching profile was predicted. A theoretical model was established by comparing the simulated etching results with calculated ones; it was presumed that the etching process was firstly a thermal dominant one, then a photochemical interaction dominant one, and finally a thermal one again.
 
Key words: Laser etching, aluminum thin film, polyimide, etching profile.